Challenges and Opportunities - Focused Ion Beam Processing at the Nano-scale
1 : Laboratoire de Photonique et de Nanostures CNRS (LPN-CNRS) - Route de Nozay 91460 Marcoussis - France
CNRS : UPR020
In this presentation we will present our work aiming to explore the nano-structuring potential of a highly
focussed pencil of ions. We will show that Focused Ion Beam technology (FIB) is capable of overcoming
some basic limitations of current nano-fabrication techniques and to allow innovative patterning schemes
for nanoscience. In this work, we will first detail the very high resolution FIB instrument we have
developed specifically to meet nano-fabrication requirements. Then we will introduce and illustrate some
new patterning schemes we propose for next generation FIB processing. These patterning schemes are (i)
Nano-engraving of membranes as a template for nano-pores and nano-masks fabrication. (ii) Local defect
injection for magnetic thin film direct patterning. (iii) Functionalisation of graphite substrates to prepare
2D-organized arrays of clusters. (iv) Selective epitaxy of III-V semiconductors on FIB patterned surfaces.
Finally we will show that FIB patterning is fully compatible with “bottom-up” or “organisation” processes.
We will conclude this presentation by introducing some emerging concepts and principles we have started
to explore for next-generation FIB processing and systems.
focussed pencil of ions. We will show that Focused Ion Beam technology (FIB) is capable of overcoming
some basic limitations of current nano-fabrication techniques and to allow innovative patterning schemes
for nanoscience. In this work, we will first detail the very high resolution FIB instrument we have
developed specifically to meet nano-fabrication requirements. Then we will introduce and illustrate some
new patterning schemes we propose for next generation FIB processing. These patterning schemes are (i)
Nano-engraving of membranes as a template for nano-pores and nano-masks fabrication. (ii) Local defect
injection for magnetic thin film direct patterning. (iii) Functionalisation of graphite substrates to prepare
2D-organized arrays of clusters. (iv) Selective epitaxy of III-V semiconductors on FIB patterned surfaces.
Finally we will show that FIB patterning is fully compatible with “bottom-up” or “organisation” processes.
We will conclude this presentation by introducing some emerging concepts and principles we have started
to explore for next-generation FIB processing and systems.
